FURI | Summer 2023

Accelerating the Discovery of High-k Oxides for Future Generations of Semiconducting Devices through Computational Simulations

The improvement of semiconducting devices, coupled with the implementation of the Creating Helpful Incentives to Produce Semiconductors for America Act (CHIPS and Science Act), facilitates the need to find an alternative to traditional silicon dioxide in semiconductors. High-k oxides have emerged as a promising material to enhance the performance and scaling down of semiconducting devices. High-k oxides enable higher capacitance, leading to reduced leakage and power consumption as well as faster processing speeds and increased functionality. This study aims to utilize computational simulations to streamline the discovery process of high-k oxides, reduce time and effort, and accelerate the identification of promising materials for future semiconductor applications.